用途 Applications | 用水指標 Water Indicators | 參考標準 Reference standard |
護膚品、洗發水、染發劑、牙膏生產和各種清洗液生產用純水 Purewater for Skin-care products, shampoo, hair dyes, toothpaste production and a variety of cleaning fluid | 電導率≤2μs/CM Electric conductivity ≤2μs/CM | 飲用純凈水標準（GB17324-98） Purified drinking water standards（GB17324-98）
醫用純化水標準（GMP2010版） Medical standards for purified water（GMP2010version） |
超純材料和超純化學試劑 石英、硅材料生產、加工、提純 電子半導體、集成電路板上用到的化工材料 Ultra-pure materials and ultra-pure chemical reagents Quartz, silicon material production, processing, purification Electronic semiconductors, integrated circuit boards used in chemical materials | 電阻率15 ~18.25 MΩ.CM Resistivity 15 ~18.25 MΩ.CM | 我國電子級水質技術指標GB11446-1-1997 Electronic-grade water quality technical indicators of Chinese standard GB11446-1-1997
美國半導體工業用純水指標 The U.S. semiconductor industrial pure water indicators |
普通化工材料的生產和加工過程所用的溶劑及清洗過程 Common chemical material production and dissolvent in the processing and rinsing process | 電導率≤10μs/CM Electric conductivity≤10μs/CM | 飲用純凈水標準（GB17324-98） Purified drinking water standard (GB17324-98) |
實驗室和中試車間 Lab and pilot plant | 電阻率15 ~18.25 MΩ.CM） Resistivity 15 ~18.25 MΩ.CM | 實驗室高純水標準 GB 6682-92 Lab high-water standards( GB 6682-92) |
高純墨水、傳真打印機中的噴墨、納米墨水 Purity ink, fax, printer inkjet, nano-ink | 電阻率15 ~18.25 MΩ.CM） Resistivity 15 ~18.25 MΩ.CM | 我國電子級水質技術指標GB11446-1-1997 Electronic-grade water quality technical indicators of Chinese standard GB11446-1-1997 美國半導體工業用純水指標 The U.S. semiconductor industrial pure water indicators |
主要工藝流程和出水指標： | |
Main technical process and standard of output water： | |
◆ 預處理+一級反滲透（電導率≤10μs/CM） | |
Pre-treatment+ one stage reverse osmosis system (electric conductivity≤10μs/CM） | |
◆ 預處理+二級反滲透（電導率≤2μs/CM） | |
Pre-treatment+ double stage reverse osmosis system (electric conductivity≤2μs/CM） | |
◆ 預處理+反滲透+離子交換器（電阻率≥15MΩ.CM） | |
Pre-treatment+ stage reverse osmosis system+ion exchange (electric conductivity≥15MΩ.CM） | |
◆ 預處理+一級反滲透+EDI（電阻率≥15MΩ.CM） | |
Pre-treatment+ stage reverse osmosis system+EDI (electric conductivity≥15MΩ.CM） | |
◆ 預處理+二級反滲透+EDI +拋光混床（電阻率≥18.25MΩ.CM） | |
Pre-treatment+ double stage reverse osmosis system+EDI +polishing mixed bed (electric conductivity≥18.25MΩ.CM） | |
詳細工藝需根據原水水質及產水要求情況進行設計 | |
The detailed process shall be designed according to the raw water quality and water production requirements |
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